Vantage Technology Announced it formally Qualified its SlurryScope™ System at Major IC Production Fabs

Vantage Technology today announced it has formally qualified its SlurryScope™ System at major IC production fabs, underscoring its capabilities to continuously analyze undiluted slurry in real time. Used during the chemical-mechanical planarization (CMP) of semiconductor wafers, the innovative metrology tool orchestrates patented laser particle-sensing techniques, powerful algorithms and multicore image processing to analyze production strength slurry with real-time measurements.

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www.businesswire.com/news/home/20120705005010/en/Vantage-Technology-Qualifies-SlurryScope%E2%84%A2-System-Major-IC